Glossary entry (derived from question below)
English英语 term or phrase:
photolithography step
Chinese汉语 translation:
平板印刷步骤
Added to glossary by
Chinexpert
May 7, 2002 04:45
22 yrs ago
English英语 term
photolithography step
English英语译成Chinese汉语
其它
摄影/影像(及美术)
photo
Anti-reflective coating products are designed for use in the photolithography step of semiconductor manufacturing.
Proposed translations
(Chinese汉语)
4 +5 | 照相平版印刷术;光刻、光刻蚀法 |
Libin PhD
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4 | 微影制程 |
Xiaoping Fu
![]() |
Proposed translations
+5
7分钟
Selected
照相平版印刷术;光刻、光刻蚀法
照相平版印刷术;光刻、光刻蚀法
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Note added at 2002-05-07 05:36:12 (GMT)
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在半导体行业,应该译为光蚀刻法步骤或光刻步骤,这是制造集成电路的基本步骤。我这两天在给台湾威能资讯公司以两份汉译英的材料,就是讲的IC制造程序。
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Note added at 2002-05-07 05:42:20 (GMT)
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Computer desktop encyclopedia:
photolithography
A lithographic technique used to transfer the design of circuit paths onto printed circuit boards as well as the circuit paths and electronic elements of a chip onto a wafer\'s surface.
A photomask is created with the design for each layer of the board or wafer (chip). The board or wafer is coated with a light-sensitive film (photoresist) that is hardened when exposed to light shining through the photomask. The board or wafer is then exposed to an acid bath (wet processing) or hot ions (dry processing), and the unhardened areas are etched away. See chip and printed circuit board.
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Note added at 2002-05-07 06:30:17 (GMT)
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蚀刻是IC制造的一个步骤,这里仍然可以是平版印刷法将涉及的线路转移到线路板的基板上(substrate),这大概就是印刷线路的由来,然后再蚀刻,并沉积金属形成线路板。
--------------------------------------------------
Note added at 2002-05-07 06:38:50 (GMT)
--------------------------------------------------
因此建议使用:
平版印刷步骤
--------------------------------------------------
Note added at 2002-05-07 05:36:12 (GMT)
--------------------------------------------------
在半导体行业,应该译为光蚀刻法步骤或光刻步骤,这是制造集成电路的基本步骤。我这两天在给台湾威能资讯公司以两份汉译英的材料,就是讲的IC制造程序。
--------------------------------------------------
Note added at 2002-05-07 05:42:20 (GMT)
--------------------------------------------------
Computer desktop encyclopedia:
photolithography
A lithographic technique used to transfer the design of circuit paths onto printed circuit boards as well as the circuit paths and electronic elements of a chip onto a wafer\'s surface.
A photomask is created with the design for each layer of the board or wafer (chip). The board or wafer is coated with a light-sensitive film (photoresist) that is hardened when exposed to light shining through the photomask. The board or wafer is then exposed to an acid bath (wet processing) or hot ions (dry processing), and the unhardened areas are etched away. See chip and printed circuit board.
--------------------------------------------------
Note added at 2002-05-07 06:30:17 (GMT)
--------------------------------------------------
蚀刻是IC制造的一个步骤,这里仍然可以是平版印刷法将涉及的线路转移到线路板的基板上(substrate),这大概就是印刷线路的由来,然后再蚀刻,并沉积金属形成线路板。
--------------------------------------------------
Note added at 2002-05-07 06:38:50 (GMT)
--------------------------------------------------
因此建议使用:
平版印刷步骤
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1天 6小时
微影制程
几点补充说明:
photolihography 的原始含义是照相制版术、照相平板印刷术。
移植到半导体技术中,指将各种电路图形(patterns)转移到晶圆(wafer)表面的过程。蚀刻是(etch)下一道工序。翻译时很多人仍然沿用“照相平板印刷术”的译名。也有人译为“微影制程”或“微影工程”。
有时,人们直接用这个词指一种由Affymetrix 公司发明的直接光学干蚀刻方法(不同一般的化学湿蚀刻方法),因为在这种新的技术中,照影的过程和蚀刻的过程密不可分,不过是一个过程的几个不同的步骤而已。在这种情况下,多译为“光学蚀刻法”或“光罩蚀刻法”。
在给出的文字中,一般地提及半导体技术中的"photolithography step",而且是单数形式,也许译为“微影制程工序”概括性比较强一些。
photolihography 的原始含义是照相制版术、照相平板印刷术。
移植到半导体技术中,指将各种电路图形(patterns)转移到晶圆(wafer)表面的过程。蚀刻是(etch)下一道工序。翻译时很多人仍然沿用“照相平板印刷术”的译名。也有人译为“微影制程”或“微影工程”。
有时,人们直接用这个词指一种由Affymetrix 公司发明的直接光学干蚀刻方法(不同一般的化学湿蚀刻方法),因为在这种新的技术中,照影的过程和蚀刻的过程密不可分,不过是一个过程的几个不同的步骤而已。在这种情况下,多译为“光学蚀刻法”或“光罩蚀刻法”。
在给出的文字中,一般地提及半导体技术中的"photolithography step",而且是单数形式,也许译为“微影制程工序”概括性比较强一些。
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